Analysis of GaAs-Ti thin films deposited by sputtering onto c-Si and GaAs

摘要

Some sputtering processes of GaAs and Ti onto\udglass, c-Si and c-GaAs substrates have been carried out in order\udto obtain thin films as candidates to be intermediate band\udphotovoltaic materials. This work presents first results\udconcerning the optical and structural properties of the different\uddeposited thin films.